This
capability is unique to the nkd range and guarantees photometric
precision, unattainable with conventional spectrophotometers.
Key features
of the nkd thin film analysis systems, are the ability to capture
spectra using polarised (s- and p-) or unpolarised light and at
continuously varying angles of incidence, enabling thin, multilayer and
complex films to be analysed with ease.
The X Y
mapping platform enables film thickness and refractive index profiling
of entire substrates and scanning can be performed over a wide spectral
range.
Full data capture and thin film analysis takes only 15 minutes and the
powerful Pro-Optix™
software makes the whole process of obtaining film thickness and
dispersion for your coatings fast and simple. In fact, for a single
layer of unknown poperties, the nkd can obtain the film thickness,
refractive indices (dispersion) and absorption coefficient –
from just one measurement !
Transparent
samples are handled with ease and are infact an advantage as they allow
for the determination of absolute absorption (1-(T+R)). Transparent
substrates require no roughening or blackening of the back surface -
they are simply placed as manufactured on the sample stage. Metallic
films are also catered for in the analysis with metal algorithms.
A wide selection of accessories
are available, making this the most flexible thin film analysis system
available.
Why
not call Aquila today to discuss your requirements and send in your
thin film samples for analysis, or arrange a demonstration. For more
details on the nkd 8000, please use the contact form, or download our
brochure.
Download
pdf brochures
nkd-8000 brochure
Downnload
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Sample
submission guidelines.
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